Downstream plasma source – 2.45 GHz
This surface wave type of plasma source generates plasma in a dielectric material tube (diameter 20-60 mm) placed in a standard WR340 waveguide. This plasma source enables the ignition and sustaining of long plasma columns depending on the pressure, the microwave power and the nature of the ‘plasma’ gas
Surfaguide plasma source – 2.45 GHz
Surfaguide plasma source generates plasma in a dielectric tube via a surface wave. The main feature of the Surfaguide is the reduced height of the standard waveguide to locally intensify the microwave electric field and consequently, help with the ignition and sustaining the plasma. This source is principally suited for operation in the range of a few mbar up to atmospheric pressure.
| Pressure Range | A few 10¯² mbar up to atmospheric pressure |
| Gas Type | Ar, N₂, O₂. Air, …. |
| Maximum Power | 6kW |
| Applications | Creation of radicals / reactive species, surface activation, PECVD, gas abatement, gasification, sterilization (UV), nano powder synthesis |
S-Wave plasma source – 2.45 GHz
The S-wave is a plasma reactor used for microwave propagation and designed to launch a surface electromagnetic wave. The S-wave is an effective plasma source for the production of reactive / excited species using a 6 mm or 8 mm diameter dielectric tubes. When used for measurements and analysis, to avoid Spurious spectral lines due to the mains 50/60 Hz we recommend using Sairem low ripple solid state microwave generator GMS 200 W. or GMS 450W
The S-Wave plasma source is inductively coupled, thus only two tuning adjustments are provided to match the impedance. Generally, nearly 0 % of reflected power is achieved using the integrated tuners. In addition, for given operator-set discharge conditions, the plasma is fully reproducible without any need for retuning at start-up. Quick connectors are integrated for water cooling and for gas connection. An optional ignition system based on Dielectric Barrier Discharge could be mounted in order to breakdown easily even at atmospheric pressure.
| Frequency | 2450MHz ± 50MHz |
| Microwave Power Max | 450 Watt. |
| Pressure Range | A few 10¯² mbar up to atmospheric pressure |
| Gas Type | Ar, N₂, O₂. Air, …. |
| Gas Flow | At ATM pressure 1 to 30 l/min., Min 5 l/min is recommended for ignition |
| Applications | Creation of radicals / reactive species, surface activation, elementary analysis |
Plasma sources – AURA-WAVE
The AURA-WAVE ECR microwave plasma source has been designed to sustain microwave plasma over several decades of pressure, i.e. from 10-4 mbar to a few 10-2 mbar and from a few watt microwave power whatever the gas. Equally, the coaxial plasma source was designed to avoid inside power-losses and has proved to be matched , i.e. no reflected power with no additional impedance matching system over 2 to 3 pressure decades, depending on the plasma gas. Plasma density up to a few 1011 cm-3 could be easily obtained in multisource configuration in different gases like argon, oxygen, nitrogen.
AURA-WAVE is designed to be used equally in R&D laboratories and industry for a very large range of applications. Typical applications of such source are generation of radicals (e.g. atomic oxygen), etching, PECVD, surface treatment (nitruration, cleaning etc.) and it is ideal for working in the low pressure range i.e. with high energy particles.
| Frequency | 2450MHz – 2500MHz, 0.1MHZ increment | ||||
| Microwave Power Max | 200 Watt | ||||
| Pressure Range | A few 10¯⁴ mbar up to few 10 ¯²mbar | ||||
| Plasma Density
(measured in Ar - O² -N²) |
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| Applications | Creation of radicals (eg. Atomic oxygen etching), surface treatment |
Plasma sources – HI-WAVE
The HI-WAVE microwave collisional plasma source has been designed to sustain microwave plasma from 10-2 mbar to a few 10-1 mbar and from a few watt microwave power whatever the gas. As the AURA-WAVE ECR coaxial plasma source, the HI-WAVE collisional coaxial plasma source was designed to avoid inside power-losses and has proved to be matched, i.e. no reflected power with no additional impedance matching system over 1 pressure decade, depending on the plasma gas. Moreover, plasma density higher than 1012 cm-3 could be easily obtained in multisource configuration at a few cm from the sources.
HI-WAVE is designed to be used equally in R&D laboratories and industry for a very large range of applications. Typical applications of such source are generation of radicals (e.g. atomic oxygen), etching, PECVD (e.g. nanocrystalline diamond deposition), surface treatment (nitruration, cleaning etc.), sterilization...
| Frequency | 2450MHz – 2500MHz, 0.1MHZ increment | ||||
| Microwave Power Max | 200 Watt | ||||
| Pressure Range | A few 10¯² mbar up to few 10 ¯¹mbar | ||||
| Plasma Density
(measured in Ar - O² -N²) |
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| Applications | Creation of radicals (eg. Atomic oxygen etching), PECVD, surface treatment, sterilization |
